In addition, we can offer the customized resin depending on demand properties excepting listed grade below.
For example, adjustment of m-cresol/p-cresol ratio, Mw, DR, and also modification by other monomer (derivatives of phenol, aldehyde, and other linker).
Please feel free to contact us.
|Mw [ - ]||DR[Å/s]※||Feature|
“Photoresist is used to form circuit pattarn on manufacturing process of semi-conductor and FPD.
Physically and chemical changes of photoresist is occurred by light irradiation, this phenomenon is applied to form circuit pattern.
In particular, firstly photoresist is coated on silicon wafer, and then coated wafer is exposed to light to form circuit pattern by transfer printing.
Photoresist has two types, "positive resist and negative resist".
The portion part of "positive resist "that is exposed to light becomes soluble to developer.
In an opposite way, negative resist becomes insoluble to developer by exposion. Phenolic resin is used as base resin in photoresist formulation.
The transparent electrode TFT element is formed by transparent electrode
membrane being evaporated on the glass substrate with photo-lithography of cresol resin photoresist.
※The data mentioned above are not guaranteed values, but representative ones.